Electrode pattern forming method
AssigneeSharp Kabushiki Kaisha
InventorsHiromi Nishino, Keiji Tarui, Hideyuki Toyoshi, Tatsuo Morita
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Abstract
An electrode pattern forming method comprising the steps of: forming a transparent conductive film on a substrate, covering said transparent conductive film with an aluminum film, forming a resist material film for etching on said aluminum film, exposing said resist material film followed by developing by immersing said substrate in an electrolyte to form a resist pattern, and patterning said aluminum film using said resist pattern as a mask; the formation of said resist pattern in said electrolyte being conducted with another transparent conductive film which is in direct contact with said electrolyte and electrically connected to said aluminum film.
Claims22
An electrode pattern forming method comprising the steps of:
- forming a primary transparent conductive film and an auxiliary transparent conductive film on first and second substrates, respectively;
- covering said primary transparent conductive film with an aluminum film;
- forming a photoresist on said aluminum film;
- exposing said photoresist;
- developing said photoresist by electrically connecting said primary film and said auxiliary film and immersing said first substrate and a portion of said second substrate in an electrolyte to prevent corrosion of said primary film and to form a photoresist pattern;
- and
- etching said aluminum film using said photoresist pattern as a mask.
A electrode pattern forming method comprising the steps of:
- forming spaced-apart first and second transparent conductive films on substrate material;
- covering at least said first transparent conductive film and a portion of said second transparent conductive film with an aluminum film;
- forming a photoresist film on said aluminum film;
- exposing said photoresist film;
- developing said photoresist film by immersing said substrate material in an electrolyte containing a saccharose to form a photoresist pattern;
- and
- etching said aluminum film using said photoresist pattern as a mask.
A method for forming an electrode pattern comprising:
- forming first and second separate transparent conductive films on at least one substrate;
- covering all of said first film and a portion of said second film with an aluminum film;
- forming a photoresist on the aluminum film;
- exposing said photoresist;
- developing said photoresist by immersing said substrate in an electrolyte to form a photoresist pattern, wherein said second film serves as a sacrifice anode to prevent corrosion of said first film;
- and
- etching said aluminum film using said photoresist pattern as a mask.
Dependencies are inferred from the claim text.