Ethylene copolymer and method of producing same
AssigneeMitsubishi Petrochemical Co., Ltd.
InventorsTadao Okada, Hajime Ikeno, Yuji Ozeki, Yoshikazu Higaki, Koshi Matsubara, Kenichi Nakamura
Life of this patent
Estimating the term…
Loading patent…
AssigneeMitsubishi Petrochemical Co., Ltd.
InventorsTadao Okada, Hajime Ikeno, Yuji Ozeki, Yoshikazu Higaki, Koshi Matsubara, Kenichi Nakamura
Estimating the term…
A copolymer is manufactured by allowing ethylene (A) and vinyl compounds (B) represented by the following general formula to undergo radical polymerization at a pressure of 1000-5000 kg/cm.sup.2 and a temperature of 100.degree.-400.degree. C., ##STR1## wherein R.sub.1 and R.sub.2 are each an independent hydrogen atom or a methyl group, R.sub.3 is a hydrogen atom or an alkyl group of 1-4 carbon atoms; a ratio of (B) to the sum of (A) and (B) is less than 1 mol %; a proportion of the amount of vinyl compounds (B), which are not successively bonded at all to the units (B) in the chain, but bonded to unlike units (A) on both sides thereof, to the total amount of (B) units in the copolymer is at least a 83%; and an MFR of the copolymer ranges from 0.1 to 200 g/10 min. Although the copolymer contains only a small amount of the vinyl compound (B) it nevertheless has excellent photo stabilizing effects.
An ethylene copolymer having improved light stability which consists essentially of ethylene (A) and vinyl compound (B) represented by the following formula:
A ethylene copolymer having improved light stability which consists essentially of ethylene (A) and a vinyl compound (B) represented by the formula:
Dependencies are inferred from the claim text.