Process and apparatus for preparing superconducting thin films
AssigneeSumitomo Electric Industries, Ltd.
InventorsHideo Itozaki, Hisao Hattori, Keizo Harada, Kenjiro Higaki
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Abstract
A process for preparing a thin film of high-temperature compound oxide superconductor by a magnetron sputtering method. A substrate and a target are arranged in parallel with each other in a vacuum chamber and one of the substrate and the target is moved relative to and in parallel with the other while the thin film is formed by sputtering.
Claims13
A process for preparing a thin film of high-temperature compound oxide superconductor on a substrate by a magnetron sputtering method, characterized in that the substrate and a sputtering target are arranged in parallel with each other in a vacuum chamber and one of the substrate and the target is moved reciprocally along two mutually perpendicular directions X, Y, and in parallel with the other while the thin film is formed by sputtering.
A magnetron sputtering apparatus for preparing a thin film of high-temperature compound oxide superconductor on a substrate, having a target holder on which a target is adapted to be secured and a substrate holder on which a substrate is adapted to be secured in a vacuum chamber, characterized in that the apparatus further has a means for moving one of the substrate and the target reciprocally along two mutually perpendicular directions X, Y, and in parallel with the other (during) while the thin film is formed by sputtering.
Dependencies are inferred from the claim text.