Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions
AssigneeHoechst Celanese Corporation
InventorsChengjiu Wu, Anne Mooring, James T. Yardley
Life of this patent
Estimating the term…
Abstract
Photosensitizers containing saturated and unsaturated polycyclic compounds containing the cyclopentane-2-diazo-1,3-dione structural unit. These compounds have their maximum u.v. absorption at around 248 nm, decompose into polar products upon irradiation, and can be used as photosensitizers in positive deep u.v. or excimer laser (248 nm) lithography. They are most preferably useful with deep u.v. transparent resins for forming photoresists.
Claims7
A photosensitive composition comprising in admixture:
- (a) from about 65% to about 98% based on the weight of the non-solvent parts of the composition of 4-tert-butylstyrene/maleimide copolymer binder resin;
- and
- (b) from about 2% to about 35% based on the weight of the non-solvent parts of the composition of a component selected from the group consisting of ##STR18## (c) a solvent selected from the group consisting of diglyme, propylene glycol monoalkyl ether and propylene glycol monoalkyl ether acetate in an amount sufficient to form a substantially uniform admixture of the composition components.
A photographic element which comprises a substrate and a dried photosensitive composition substantially uniformly coated on said substrate which photosensitive composition comprises in admixture;
- (a) from about 65% to about 98% based on the weight of the non-solvent parts of the composition of 4-tert-butylstyrene/maleimide copolymer;
- and
- (b) from about 2% to about 35% based on the weight of the non-solvent parts of the composition of a component selected from the group consisting of ##STR19##
Dependencies are inferred from the claim text.