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US 5,182,095 AGranted
Method for processing residues from the distillation of chlorosilanes
AssigneeHuls Troisdorf Aktiengesellschaft
InventorsKlaus Ruff, Bernhard Falk, Detlef Liesching
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Abstract
A residue from the production of chlorosilanes from raw silicon is treated with steam and aditionally with nitrogen-oxygen mixtures. The resulting residue has a lower chloride content.
Claims5
A method of processing a residue which is produced as bottom product after the distillation of chlorosilane from the hydrochlorination or chlorination of silicon, consisting essentially of:
- subjecting the residue to a hydrolysis with steam and releasing hydrogen chloride from the residue;
- and then contacting the residue with a mixture of nitrogen and oxygen at a temperature of 60.degree. to 1400.degree. C.
Dependencies are inferred from the claim text.