Plasma generator with secondary radiator
AssigneeRoehm GmbH Chemische Fabrik
InventorsMichael Heinemann, Bernhard Soeder, Wolfgang Meier
Life of this patent
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Abstract
The present invention is directed to a plasma generator which can generate a localized plasma. To localize the plasma, a low pressure plasma generator, containing a vacuum chamber and at least one microwave radiation source, which does not by itself produce a field strength sufficient to form plasma in the vacuum chamber, is equipped with at least one aerial for the radiation of microwaves. This at least one aerial acts as a secondary radiator in the vacuum chamber and can generate a localized plasma at its free tips.
Claims10
A low pressure plasma generator for subjecting a substrate to a plasma, comprising:
- a vacuum chamber in which said substrate is located;
- at least one microwave radiation source for generating microwaves which enter said vacuum chamber, wherein the microwave radiation source does not by itself produce a field strength sufficient to form plasma in the vacuum chamber;
- at least one aerial acting as a secondary radiation source for the secondary radiation of microwaves in the vacuum chamber, wherein the secondary radiation of microwaves forms a plasma at a tip of the at least one aerial.
Dependencies are inferred from the claim text.