Method and apparatus for making charged particle beam exposure

A charged particle beam exposure method for exposing an exposure region of a substrate which is placed on a movable stage by irradiating a charged particle beam on the exposure region of the substrate, said charged particle beam exposure method comprising the steps of:

• (a) dividing the exposure region into a plurality of band-shaped regions;
• (b) deflecting the charged particle beam within a drawing range from one side to the other side of each band-shaped region in a longitudinal direction of the band-shaped region while continuously moving the stage in a stage moving direction, said drawing range being a range in which the charged particle beam can be deflected;
• (c) monitoring a deflection position of the charged particle beam on the substrate along the stage moving direction;
• and
• (d) varying a moving speed of the stage depending on an integrated value of the deflection position, said deflection position being integrated at predetermined time intervals.

A charge particle beam exposure apparatus comprising:

• a stage which is movable in a stage moving direction and has a substrate placed thereon, said substrate having an exposure region which is divided into a plurality of band-shaped regions;
• driving means for driving the stage;
• means for irradiating a charged particle beam on the exposure region of the substrate on the stage;
• deflection means for deflecting the charged particle beam within a drawing range from one side to the other side of each band-shaped region in a longitudinal direction of the band-shaped region while the stage is continuously moved by the driving means;
• comparator means for comparing a deflection position of the charged particle beam on the substrate along the stage moving direction with one or a plurality of reference positions;
• and
• control means, coupled to the driving means and the comparator means, for controlling the driving means so that a moving speed of the stage varies depending on the deflection position relative to one or a plurality of reference positions located along the stage moving direction within the drawing range.

A charge particle beam exposure apparatus comprising:

• a stage which is movable in a stage moving direction and has a substrate placed thereon, said substrate having an exposure region which is divided into a plurality of band-shaped regions;
• driving means for driving the stage;
• means for irradiating a charged particle beam on the exposure region of the substrate on the stage;
• deflection means for deflecting the charged particle beam within a drawing range from one side to the other side of each band-shaped region in a longitudinal direction of the band-shaped region while the stage is continuously moved by the driving means;
• integration means for integrating a deflection position of the charged particle beam on the substrate along the stage moving direction at predetermined time intervals;
• and
• control means, coupled to the driving means and the integration means, for controlling the driving means so that a moving speed of the stage varies depending on the integrated value of the deflection position.