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US 5,180,655 AGranted
Chemical compositions for improving photolithographic performance
AssigneeHewlett-Packard Company
InventorJames R. Sheats
Life of this patent
Estimating the term…
Abstract
Chemical compositions are presented that provide an increased rate of processing in a photolithography process in which a bleachable layer on top of a photoresist is bleached to produce a contact mask and then the photoresist is exposed through this contact mask. These compositions have increased oxygen permeability and increased solubility for a bleachable dye. Also, a class of dyes is presented that increase the process speed.
Claims10
A photolithographic method comprising the steps of:
- (a) forming a photoresist layer on a substrate;
- (b) forming, on top of said photoresist layer, a bleachable layer containing a bleachable dye in a polymer matrix containing siloxy groups and organic groups;
- (c) exposing said bleachable layer with preselected pattern of light to convert said bleachable layer into a contact mask;
- (d) making said contact mask insensitive to light used to expose the photoresist layer through this contact mask;
- and
- (e) exposing with light said photoresist layer through said contact mask to transfer the pattern of the contact mask into the photoresist layer.
3 more elements
Dependencies are inferred from the claim text.