Electron beam-curable resist composition and method for fine patterning using the same

A method for patterning a resist layer by using an electron beam-curable resist composition which comprises the steps of:

• (a) coating a substrate surface with a resist composition in the form of a solution comprising
• (A) a 1,3,5-triazine compound represented by the general formula ##STR4## in which Z is a 4-alkoxy-substituted phenyl group of the general formula ##STR5## R.sup.1 being an alkyl group having 1 to 5 carbon atoms, or a 4-alkoxy-substituted .alpha.-naphthyl group of the general formula ##STR6## R.sup.2 being an alkyl group having 1 to 5 carbon atoms and R.sup.3 and R.sup.4 being, each independently from the other, a hydrogen atom, hydroxy group or carboxyl group,
• (B) a cresol novolac resin, in which at least 30% by weight of the cresol moiety is derived from m-cresol, and
• (C) an alkoxymethylated melamine resin, in which the amount of the component (A) is in the range from 2 to 10% by weight based on the total amount of the components (B) and (C) and the weight ratio of the component (B) to the component (C) is in the range from 60:40 to 95:5, and drying to form a uniform electron beam-sensitive resist layer;
• (b) irradiating the electron beam-sensitive resist layer patternwise with electron beams to form a latent image;
• (c) heating the resist layer having the latent image at a temperature in the range from 90.degree. to 140.degree. C. for a length of time in the range from 30 to 300 seconds to effect sensitization of the latent image;
• and
• (d) developing the thus sensitized latent image with an aqueous solution of an organic alkaline compound as a developer solution.