Method of shaping superconducting oxide material
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorShunpei Yamazaki
Life of this patent
Estimating the term…
Abstract
A method of forming a superconducting oxide material comprises the steps of forming of a superconducting oxide material into a thin film on a film-forming surface portion, creating a plasma to form an activated oxygen atmosphere, subjecting the thin film to a magnetic field through the thickness of the thin film, thereby injecting the activated oxygen into the thin film so that crystals of the superconducting oxide material are aligned parallel or perpendicular to the film-forming surface portion.
Claims7
A method for forming an improved superconducting oxide material comprising the steps of placing a superconducting oxide material into a plasma generating chamber, and oxygen annealing the superconducting oxide material by subjecting it to an activated oxygen treatment in which one of oxygen and oxide gas is introduced and activated by converting it to plasma while simultaneously applying a magnetic field to said material to thereby increase the rate of said annealing step.
A method of forming superconducting copper oxide ceramic materials comprising the steps of:
- disposing a superconducting copper oxide based ceramic material in a vacuum chamber;
- introducing a reactive gas comprising oxygen into said vacuum chamber;
- inputting energy to said reactive gas in order to product a plasma of oxygen;
- applying a magnetic field to said superconducting material in the atmosphere of said plasma.
Dependencies are inferred from the claim text.