Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams
AssigneeThe United States of America as represented by the United States Department of Energy
InventorsAndrew M. Hawryluk, Natale M. Ceglio
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Abstract
Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.
Claims9
A method for substantially distortion-free imaging of a reticle onto a wafer, comprising:
- imaging the reticle onto an encodable mask through a distortion producing imaging system in one direction;
- patterning the reticle image onto the encodable mask to form an encoded mask;
- replacing the reticle with a wafer at the same position;
- imaging the encoded mask back through the distortion producing imaging system in the opposite direction onto the wafer;
- wherein the steps of imaging the reticle and mask are performed using illumination beams selected from particle beams and electromagnetic radiation beams.
Dependencies are inferred from the claim text.