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US 5,178,683 AGranted
Microwave plasma CVD apparatus
AssigneeNew Japan Radio Co., Ltd.
InventorFumio Takamura
Life of this patent
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Abstract
A microwave CVD apparatus comprises a rectangular applicator with microwave inlets, a bell jar with an inlet and an outlet for reaction gas arranged in the applicator, and a sample-receiving table. Reaction gas is introduced into the bell jar and plasma of the reaction gas is generated therein. At least one of walls of the applicator is movable so as to change distribution of plasma intensity continuously, so that material is uniformly deposited on the whole surface of the sample.
Claims10
A microwave CVD apparatus comprising:
- an applicator having microwave inlets and forming a cavity resonator;
- a bell jar arranged in the applicator and having an inlet and an outlet for reaction gas;
- reaction gas supply means for supplying gas to said bell jar for passing from said inlet to said outlet of said bell jar;
- microwave supply means for supplying microwaves to said bell jar for generating plasma from said gas in said bell jar;
- and
- a sample-receiving table arranged in the bell jar for holding a sample;
- wherein when microwave and reaction gas are introduced into the bell jar, plasma of the reaction gas is generated and material is deposited on the surface of the sample;
- and wherein said applicator comprises at least two walls for forming said cavity resonator, one of said at least two walls is movable for access to said sample-receiving table within said bell jar, and at least one further wall of said at least two walls of the applicator is movable for changing a distribution of plasma intensity within said bell jar.
5 more elements
Dependencies are inferred from the claim text.