Charged particle beam exposure device for improving the heating state of block mask

A charged particle beam exposure device having a charged particle optical column for selecting one or more minute block patterns from a plurality of block patterns formed on a block mask, and for irradiating a charged particle beam having a specific sectional shape determined by said selected block pattern onto a surface of a substrate to be processed, wherein said charged particle beam exposure device comprises:

• a beam generation means for generating said charged particle beam;
• a first beam control means, provided between said beam generation means and said block mask, for deflecting and irradiating said charged particle beam generated by said beam generation means onto said block mask;
• a second beam control means, provided between said block mask and said substrate, for deflecting and focusing said charged particle beam having said specific sectional shape onto the surface of said substrate;
• and
• a third beam control means, provided between said beam generation means and said block mask, for uniformly irradiating said charged particle beam onto said block mask during a waiting period.