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US 5,176,970 AGranted
Virtually distortion-free imaging system for large field, high resolution lithography
AssigneeThe United States of America as represented by the United States Department of Energy
InventorsAndrew M. Hawryluk, Natale M. Ceglio
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Abstract
Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.
Claims10
A method for substantially distortion-free imaging of a reticle onto a wafer, comprising:
- imaging the reticle onto an encodable mask through a distortion producing imaging system in one direction;
- patterning the reticle image onto the encodable mask to form an encoded mask;
- replacing the reticle with a wafer at the same position;
- imaging the encoded mask back through the distortion producing imaging system in the opposite direction onto the wafer.
1 more element
Dependencies are inferred from the claim text.