Method of making a mirror having extremely small aperture holes at other than normal angles to the surfaces of the mirror

A method of manufacturing mirrors with at least one aperture hole, the method comprising the steps of:

• bundling a plurality of first-type glass rods around a single rod of a second-type glass, said first-type not being susceptible and said second-type being susceptible to a chemical etch;
• fusing said bundle of glass rods;
• drawing said bundle of glass rods such that a diameter of said second-type glass rod becomes substantially smaller;
• cutting a wafer from said fused and drawn bundle of glass rods at an angle;
• etching away said second type glass rod with said chemical etch to produce an aperture hole in said wafer;
• grinding one side of said wafer to reduce the thickness of said wafer at the site of said aperture hole, the grinding preceding the etching;
• plating said wafer with a reflective material;
• and
• polishing said wafer to obtain a mirror-like surface on at least one side of said wafer.

A method of manufacturing a mirror for sampling a portion of an incident light received at an angle not normal to the surface of each mirror to pass through a rectangularly-shaped aperture hole through the mirror at an angle "A" relative to a normal to the surface of the mirror wherein the inside walls of the aperture do not substantially reduce the incident light passing through the aperture hole at angle "A", the method comprising the steps of:

• bundling a plurality of rods of a first-type glass around a rectangularly-shaped bundle of rods of a second-type glass, said first-type glass being less susceptible to a chemical etch than said second-type glass;
• fusing said bundle of first and second type glass rods;
• drawing said bundle of first and second type glass rods such that a diameter of said second-type glass rod becomes substantially smaller;
• cutting a wafer from said fused and drawn bundle of first and second type glass rods at an angle that is a complement of angle "A";
• etching away from said wafer said second-type glass with said chemical etch to produce a rectangularly-shaped aperture hole that passes through said wafer at an angle "A"relative to a normal to the surface of each mirror wherein the inside walls of the rectangularly-shaped aperture do not substantially interfere with incident light passing through the aperture hole at angle "A";
• and
• depositing on at least one surface of said wafer a reflective material such that a mirror is formed thereby.