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US 5,175,755 AGranted
Use of a Kumakhov lens for X-ray lithography
AssigneeX-Ray Optical System, Inc.
InventorMuradin A. Kumakhov
Life of this patent
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Abstract
An X-ray lithography device which utilizes a Kumakhov lens is disclosed. This device is capable of using both small area sources and synchrotron sources. This device provides improved X-ray control, precision and accuracy. Also provided is a method of X-ray lithograph which incorporates a Kumakhov lens.
Claims26
An X-ray lithographic system comprising a Kumakhov lens.
A method for X-ray lithography, which comprises:
- providing a source of radiation;
- focusing the radiation from the source through a Kumakhov lens;
- and passing the focused radiation through a mask.
A method for X-ray lithography, which comprises:
- providing a source of radiation;
- focusing the radiation from the source through a Kumakhov lens to form a quasi-parallel beam;
- focusing the quasi-parallel beam through a second Kumakhov lens to form a beam having an energy within a preselected band;
- and passing the beam through a mask.
1 more element
Dependencies are inferred from the claim text.