Electron beam exposure system with increased efficiency of exposure operation
AssigneeFujitsu Limited
InventorsKiichi Sakamoto, Shunsuke Fueki, Hiroshi Yasuda
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AssigneeFujitsu Limited
InventorsKiichi Sakamoto, Shunsuke Fueki, Hiroshi Yasuda
Estimating the term…
An electron beam exposure system comprises a pattern data generator for producing first pattern data indicative of a desired pattern of electron beam to be written on a wafer and second pattern data indicative of the number of repetitions of the pattern specified by the first pattern data, as a time sequential mixture of the first and second pattern data. The time sequential mixture of the data is sorted in a data sorting unit into a parallel data of the first pattern data and the second pattern data. Then, a discrimination is made whether the data is the first pattern data or the second pattern data, and when the data is the second pattern data, the data that follows immediately behind the second pattern data is transferred to an output path simultaneously with the second pattern data, which is transferred to another output path. Thereby, the first and second pattern data form a parallel data. The parallel data thus formed is next compressed by deleting the data, that follows immediately behind the data which contains the second pattern data, from both output paths.
An electron beam exposure system for writing a pattern on an object, comprising:
A method for exposing a pattern on an object by an electron beam having a selectively shaped cross section, one shot by one shot, comprising the steps of:
A method for writing a pattern on an object by an electron beam having a selectively shaped cross section based upon a first data train, said first data train being a time sequential mixture of first type and second type data pairs, each first type data pair comprising first type data and second type data, said first type data specifying the desired cross section of the electron beam and said second type data specifying the number of repetitions of writing the pattern on the object by the electron beam of which the cross section thereof is specified by said first type data, and each second type data pair comprising the first type data and a third type data that is different from said second type data, comprising the steps of:
A method of sorting data that is supplied as a time sequential mixture of first type data and second type data, comprising the steps of:
A method for compressing data of a data train comprising a time sequential mixture of first type data pairs and second type data pairs, each of said first type data pairs comprising first type data specifying a desired operation and associated, second type data specifying the number of repetitions of said operation specified by the associated first type data, said second type data pair comprising third type data and said second type data, said method comprises the steps of:
Dependencies are inferred from the claim text.