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US 5,174,857 AGranted
Slope etching process
AssigneeGold Star Co., Ltd.
InventorKang H. Sung
Life of this patent
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Abstract
A slope etching process comprising the steps of coating a photoresist on a layer of hard material, baking the photoresist under a predetermined condition so that it flows down to have at its opposite side edges respective slant surface of a desired slope angle and then dry etching simultaneously the photoresist and the hard material layer so as to provide the hard material layer at its opposite side edges with a desired slope angle. In accordance with this process, the step coverage is improved, and thus the rate of poor products and the generation of noise are reduced.
Claims4
A slope etching process comprising the steps of:
- (a) coating a photoresist on a layer of hard material;
- (b) defining said hard material layer by treating said photoresist according to a photo lithography process;
- (c) baking the photoresist under a predetermined condition so that it flows down to have at its opposite side edges respective slant surface of a desired slope angle and thereby provide the hard material layer at its opposite side edges with a desired slope angle;
- and
- (d) then dry etching simultaneously the photoresist and the hard material layer under a predetermined atmosphere.
2 more elements
Dependencies are inferred from the claim text.