Spatial light modulator and method
AssigneeTexas Instruments Incorporated
InventorLarry J. Hornbeck
Life of this patent
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Abstract
An electrostatically deflectable beam spatial light modulator with the beam composed of two layers of aluminum alloy and the hinge connecting the beam to the remainder of the alloy formed in only one of the two layers; this provides a thick stiff beam and a thin compliant hinge. The alloy is on a spacer made of photoresist which in turn is on a semiconductor substrate. The substrate contains addressing circuitry in a preferred embodiment.
Claims12
A spatial light modulator, comprising:
- (a) a plurality of pixels;
- (b) each of said pixels comprising
- i. a supporting spacer,
- ii. an electrostatically deflectable element comprising a hinge layer under a beam layer,
- iii. at least one hinge, essentially only in said hinge layer and thinner than said deflectable element, connecting said deflectable element to said supporting spacer, and
- iv. addressing circuitry under said element.
A method of fabricating a deflectable beam spatial light modulator, comprising the steps:
- (a) forming addressing circuitry on a semiconductor substrate;
- (b) forming a supporting spacer over said circuitry;
- (c) forming a layer of hinge material on said spacer;
- (d) forming a thick layer of beam material over said hinge material layer;
- (e) patterning and etching said layers to define at least one hinge and at least one deflectable element such that said hinge is thinner than said deflectable element and is essentially only said hinge material;
- and
- (f) etching the portion of said spacer immediately between said deflectable beam and said addressing circuitry.
A method of fabricating a deflectable beam spatial light modulator, comprising the steps:
- (a) forming addressing circuitry on a semiconductor substrate;
- (b) forming a supporting spacer over said circuitry and substrate;
- (c) depositing a hinge layer directly or indirectly over said spacer;
- (d) masking a portion of said hinge layer;
- (e) forming a beam layer over at least exposed portions of said hinge layer;
- (f) forming a mask to define at least one hinge, at least one deflectable beam and at least one etch access hole such that said hinge is thinner than said deflectable beam and is essentially only said hinge layer;
- and
- (g) etching the portion of said spacer between said deflectable beam and said addressing circuitry.
Dependencies are inferred from the claim text.