Perfluoropolymer coated pellicle
AssigneeE. I. Du Pont de Nemours and Company
InventorsJohn M. Legare, Anestis L. Logothetis, Duck J. Yang
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Abstract
Pellicles having films bearing at least one coating of perfluoropolymers as an antireflective surface, the perfluoropolymers comprising a low molecular weight perfluoropolymer having randomly copolymerized units of tetrafluoroethylene, perfluoro (alkyl vinyl) ether and a cure site monomer, the cure site monomer selected from the group consisting of vinylidene fluoride, perfluoro-(8-cyano-5-methyl-3,6-dioxa-1-octene), bromotetrafluorobutene or perfluoro (2-phenoxypropyl vinyl ether). Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits.
Claims9
A pellicle comprising a thin optical film which is tautly adhered to one edge of a closed support frame, said film comprising a core layer having an index of refraction of about from 1.32 to 1.80 and a thickness of about 0.3 to 20 microns, the improvement wherein the film further comprises at least one antireflective layer comprising a low molecular weight pyrolyzed perfluoropolymer comprising randomly copolymerized units of tetrafluoroethylene, perfluoro (alkyl vinyl) ether and a cure site monomer, the cure site monomer being selected from the group consisting of vinylidene fluoride, perfluoro-(8-cyano-5-methyl-3,6-dioxa-1-octene), bromotetrafluorobutene or perfluoro (2-phenoxypropyl vinyl ether).
Dependencies are inferred from the claim text.