Reaction chamber with controlled radiant energy heating and distributed reactant flow
AssigneeRapro Technology
InventorsFred Wong, Yen-Hui Ku
Life of this patent
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AssigneeRapro Technology
InventorsFred Wong, Yen-Hui Ku
Estimating the term…
A reaction chamber for a controlled reaction on a reaction surface of a sample provides for controlled distribution of radiant energy over the reaction surface to offset radiant heat loss of the sample, and establishes uniform distribution of reactant flow on the sample. A lamp housing supplies radiant energy over the sample, which absorbs at least a component of the radiant energy. A support member which supports the sample within the reaction chamber is formed of a material which is essentially transparent to the radiant energy so that it does not behave as a susceptor. An array of lamps, is mounted with the reaction chamber so that direct radiant energy is transmitted through a window to the reaction surface of the sample. A reflecting surface on the housing includes a lamp seat for each lamp in the array with an individually specified position, curvature and tilt with respect to the reaction surface. A source of reactant gas is coupled through a gas port to the reaction chamber between the window and the reaction surface. A reactant distribution plate is mounted between the gas port and the reaction surface, and causes distributed flow of reactant gas over the reaction surface. The distribution plate includes a plurality of perforations having a pattern which determines the distribution of reactant gas flow.
An apparatus for supplying radiant energy over a sample having a reaction surface, the sample absorbing at least a component of the radiant energy, and characterized by a nonuniform distribution of heat loss, the apparatus comprising:
An apparatus for supplying radiant energy over a sample having a reaction surface, the sample absorbing at least a component of the radiant energy, and characterized by a nonuniform distribution of that loss, the apparatus comprising:
An apparatus for supplying radiant energy over a sample having a reaction surface, the sample absorbing at least a component of the radiant energy, and characterized by a nonuniform distribution of hat loss, the apparatus comprising:
An apparatus for supplying a flow of a gas reactant over a reaction surface on a sample, the sample absorbing radiant energy within a given range of wavelengths, comprising:
An apparatus for supplying a flow of a gas reactant over a reaction surface on a sample, the sample absorbing radiant energy within a given range of wavelengths, comprising:
An apparatus for supplying a flow of a gas reactant over a reaction surface on a sample, the sample absorbing radiation energy within a given range of wavelengths, comprising:
An apparatus for inducing a controlled reaction on a reaction surface on a sample, the sample absorbing radiant energy within a given range of wavelengths, and characterized by a nonuniform distribution of heat loss, the apparatus comprising:
An apparatus for growing an epitaxial layer on a sample having a reaction surface, the sample absorbing heat causing energy;
An apparatus of supplying a flow of a gas reactant over a reaction surface on a sample, the sample absorbing radiant energy within a given range of wavelengths, comprising:
An apparatus for inducing a controlled reaction on a reaction surface on a sample, the sample absorbing radiant energy within a given range of wavelengths, and characterized by a nonuniform distribution of that loss, the apparatus comprising:
Dependencies are inferred from the claim text.