Ion implantation of plastic orthopaedic implants
AssigneeSpire Corporation
InventorsPiran Sioshansi, Richard W. Oliver
Life of this patent
Estimating the term…
Abstract
A load-bearing plastic orthopaedic joint implant, formed aat least partially of UHMWPE or HDPE material, and a process of subjecting at least the load-bearing surface thereof to ion implantation so as to improve its surface characteristics are disclosed. Such improved surface characteristics result, inter alia, from the formation in the treated surfaces, of increased carbon to carbon bonds, diamond-like carbon chain scissions and wherein the implanted ions do not form precipitate chemical compounds with the plastic material.
Claims6
A process of ion implanting a load-bearing plastic orthopaedic joint implant comprising:
- (a) forming an orthopaedic implant at least partially from an UHMWPE or HDPE material;
- (b) mounting said implant in a chamber;
- (c) creating a vacuum of about 10.sup.-6 torr in said chamber;
- (d) exposing a surface of said implant formed of said UHMWPE or HDPE material to an ion beam to improve its surface characteristics, in particular by increasing the carbon to carbon bonds therein, with diamond-like carbon chain scission in said exposed surface;
- (e) backfilling said chamber with an inert gas to about atmospheric pressure wherein said backfilling step is maintained for a time period of at least about one hour and not exceeding about five hours so as to effect formation of said carbon to carbon bonds of said ion implanted surface;
- and
- (f) removing said ion implant from said chamber.
A process of ion implanting a load-bearing plastic orthopaedic joint implant comprising:
- (a) forming an orthopaedic implant at least partially from an UHMWPE or HDPE material;
- (b) mounting said implant in a chamber;
- (c) creating a vacuum of about 10.sup.-6 torr in said chamber;
- (d) exposing a surface of said implant formed of said UHMWPE or HDPE material to an ion beam to effect ion implantation thereof at multiple energies so as to improve its surface characteristics;
- said exposing step resulting in a total dose of ions delivered per cm.sup.2 of about 1.35 E 16;
- and an atomic concentration of the implanted ion species of about 2%;
- (e) backfilling said chamber with an inert gas to about atmospheric pressure;
- and
- (f) removing said ion implant from said chamber;
Dependencies are inferred from the claim text.