Method of making a molded field emission electron emitter employing a diamond coating
AssigneeMotorola, Inc.
InventorsRobert C. Kane, James E. Jaskie
Life of this patent
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Abstract
A field emission electron emitter employing a coating of diamond material disposed on a surface of a layer of conductive/semiconductive material is constructed by a method including the steps of implanting carbon ions at a surface of a selectively shaped substrate to function as nucleation sites for the diamond formation. A conductive layer is deposited over the diamond and the substrate is removed to leave an electron emitter with a diamond coating.
Claims15
A method of forming an electron emitter comprising the steps of:
- providing a selectively shaped substrate having a major surface;
- implanting ions, as nucleation sites, onto at least a part of the major surface of the selectively shaped substrate;
- growing diamond crystallites preferentially at at least some of the nucleation sites;
- depositing a layer of conductive/semiconductive material onto at least a part of the major surface of the substrate and the diamond crystallites;
- and
- removing at least some of the selectively shaped substrate, such that an electron emitter having a coating of diamond disposed on at least a part of the conductive/semiconductive layer is formed.
A method for forming a field emission electron emitter comprising the steps of:
- providing a substrate having a major surface;
- depositing a layer of patternable material on the major surface of the substrate;
- patterning the layer of patternable material to provide an aperture therethrough and expose a part of the major surface of the substrate;
- anisotropically etching the exposed substrate to selectively shape the substrate substantially at the exposed part;
- implanting ions, as nucleation sites, onto at least a part of the selectively shaped substrate substantially at a region corresponding to the aperture;
- growing diamond crystallites preferentially at at least some of the nucleation sites;
- depositing a layer of conductive/semiconductive material onto the major surface of the substrate and diamond crystallites;
- and
- removing at least some of the selectively shaped substrate, such that a selectively shaped electron emitter having a coating of diamond crystallites disposed thereon is formed.
A method for forming a field emission electron emitter comprising the steps of:
- providing a substrate having a major surface;
- depositing a layer of patternable material on the major surface of the substrate;
- patterning the layer of patternable material to provide an aperture therethrough to expose a part of the major surface of the substrate;
- performing an anisotropic etch to selectively shape the substrate substantially at the exposed part;
- performing a low angle material evaporation to partially close the aperture;
- implanting ions, as nucleation sites, onto at least a part of the selectively shaped substrate substantially at a region corresponding to the partially closed aperture;
- growing diamond crystallites preferentially at at least some of the nucleation sites;
- depositing a layer of conductive/semiconductive material onto the major surface of the substrate and the diamond crystallites;
- and
- removing at least some of the selectively shaped substrate, such that an electron emitter having a coating of diamond disposed on at least a part of a major surface of a selectively shaped conductive/semiconductive electrode is formed.
Dependencies are inferred from the claim text.