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US 5,124,216 AGranted
Method for monitoring photoresist latent images
AssigneeAT&T Bell Laboratories
InventorsKonstantinos P. Giapis, Richard A. Gottscho, Christian A. Green
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Abstract
The formation of latent images in photoresist can be monitored during exposure without spurious images by directing a pulsed beam of monochromatic light onto a region of the layer being exposed and selectively detecting the diffracted light. Peak formation in the normalized diffracted intensity versus time curve indicates optimal exposure of the resist.
Claims7
A method for monitoring the formation of a latent image in a layer of photoresist comprising the steps of:
- providing a workpiece having a surface coated with photoresist;
- exposing said photoresist to form a latent image in a region thereof,
- during exposure directing onto said region of said photoresist a pulsed beam of monochromatic light having a duty cycle, beam cross section and beam intensity such that total exposure from said pulsed beam is less than would produce a developable image in the resist;
- and
- selectively detecting light from said pulsed beam diffracted from said region of said photoresist.
2 more elements
Dependencies are inferred from the claim text.