Process for the protection of a diaphragm during the generation of electron beam pulses

In a process for the protection of a diaphragm during the generation of electron-beam pulses by means of alternately deflecting the electron beam onto the diaphragm and onto a processing site, the improvement being in that, in order to prevent overheating of the diaphragm surface, the electron beam is distributed with respect to space and/or time over an enlarged striking surface, the electron beam being periodically jiggled during its striking time on the diaphragm, and the electron beam being expanded during its striking time on the diaphragm.

In a process for the protection of a diaphragm during the generation of electron-beam pulses by means of alternately deflecting the electron beam onto the diaphragm and onto a processing site, the improvement being in that, in order to prevent overheating of the diaphragm surface, the electron beam is distributed with respect to space and/or time over an enlarged striking surface, and the electron beam being jiggled after the completion of the swiveling out onto the diaphragm and being deflected onto the processing site after the completion of the jiggling or expanding.

In a device for the protection of a diaphragm during the generation of electron-beam pulses by means of alternately deflecting the electron beam onto the diaphragm and onto a processing site, with an electron-beam generator and a beam guiding system, the improvement consisting of at least one deflection system or one beam expansion system by means of which said electron beam can be jiggled or expanded, a cooled diaphragm onto which said electron beam is deflected, and a control circuit by means of which said deflection system or beam expansion system is controlled during or after the deflection of said electron beam onto the diaphragm to prevent overheating of the diaphragm surface.