Detecting completion of electroless via fill
AssigneeMicroelectroncs and Computer Technology Corporation
InventorsCharles W. C. Lin, Randy L. German, Ian Y. K. Yee, David M. Sigmond
Life of this patent
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Abstract
A method for detecting the completion of electrolessly depositing metal into a via. The method includes providing a non-autocatalytic detection mask with an opening over a via containing an autocatalytic material, electrolessly depositing a conductive metal into the via which fails to plate to the mask, and continuing the deposition until metal in the via contacts the mask, at which time the electrochemical potential of the mask changes and the metal plates to and covers the entire mask. The completion of the electroless via fill can be detected by changes in both the appearance and electrochemical potential of the mask.
Claims37
A method for electrolessly fabricating metal pillars in a dielectric and indicating the pillars are fabricated, comprising the following steps:
- providing a flat first dielectric base;
- depositing a first electrically conductive metal over the first dielectric;
- depositing a second dielectric layer over the first metal;
- depositing over the second dielectric an electrically conductive detection mask containing an opening above a portion of the first metal;
- etching the second dielectric through the detection mask opening to form a via which exposes the portion of the first metal;
- electrolessly depositing a second electrically conductive metal into the via through the opening in the detection mask, wherein the first metal is autocatalytic to the electroless deposition, the detection mask is non-autocatalytic to the electroless deposition, and the second metal deposits on the exposed portion of the first metal and partially fills the via but fails to electrically connect the first metal to the detection mask and fails to deposit on the detection mask;
- continuing to electrolessly deposit the second metal into the via until the second metal fills the via, thereby forming a metal pillar in the via which electrically connects the first metal to the detection mask, at which time the second metal begins to deposit on the detection mask;
- continuing to electrolessly deposit the second metal until the second metal with a different visual appearance than the detection mask covers the top surface of the detection mask;
- and then
- discontinuing the electroless deposition of the second metal.
A method for visually indicating the completion of electrolessly plating metal into a via in a dielectric, comprising:
- providing a dielectric;
- depositing a non-autocatalytic detection mask with an opening on a surface of the dielectric;
- the dielectric;
- providing an autocatalytic material in the via;
- electrolessly plating an electrically conductive metal through the detection mask opening into the via, wherein the metal begins to fill the via but fails to plate on the detection mask until metal filled in the via is connected to the detection mask;
- and
- continuing to electrolessly plate the metal after the metal filled in the via is connected to the detection mask so that the metal plates to and covers the entire top surface of the detection mask, thereby providing a visual indication that the via is filled with metal and the electroless plating can be discontinued.
A method for providing visual detection of the completion of electrolessly plating a metal pillar into a via in a dielectric, comprising the following steps in the sequence set forth:
- providing a dielectric with a top surface;
- depositing a non-autocatalytic detection mask layer on the dielectric top surface;
- forming a plurality of openings in the detection mask, wherein each opening exposes a separate portion of the dielectric top surface;
- etching the exposed portions of the dielectric to form a plurality of vertical vias in the dielectric;
- providing an autocatalytic material in each of the vias;
- electrolessly plating an electrically conductive metal through the detection mask openings into the vias, wherein the metal partially fills the vias but fails to plate to or cover the detection mask;
- continuing to electrolessly plate the metal through the detection mask openings into the vias until the metal fills a via to form a metal pillar which contacts the detection mask, thereby allowing the metal to begin to plate to the detection mask;
- continuing to electrolessly plate the metal until the metal fills all the vias and all the detection mask openings and covers the entire top surface of the detection mask with a uniform layer, thereby allowing visual detection that uniform metal pillars have been formed;
- and
- discontinuing the electroless plating as a result of the visual detection.
A method for indicating the completion of electrolessly depositing metal into a via, comprising:
- providing a via in a dielectric;
- providing an autocatalytic material in the via;
- providing over the dielectric an electrically conductive non-autocatayltic detection mask with an opening above the via;
- electrolessly depositing an electrically conductive metal into the via wherein the metal begins to deposit on the autocatalytic material and fill the via but fails to deposit on the detection mask;
- and
- continuing the electroless deposition until the metal filled in the via electrically connects the autocatalytic material to the detection mask, at which time the metal begins to deposit a uniform layer over the entire detection mask, thereby providing a visual indication that the via is filled with metal and the electroless deposition can be discontinued.
A method for electronically detecting the completion of electrolessly depositing metal into a via, comprising:
- providing a via in a dielectric;
- providing an autocatalytic material in the via;
- providing over the dielectric an electrically conductive non-autocatayltic detection mask with an opening above the via;
- providing an electronic device which is responsive to a change in the electrochemical potential of the detection mask;
- electrolessly depositing an electrically conductive metal into the via wherein the metal begins to deposit on the autocatalytic material and fill the via but fails to deposit on the detection mask;
- continuing the electroless deposition until the metal filled in the via electrically connects the autocatalytic material to the detection mask thereby changing the electrochemical potential of the detection mask;
- and
- detecting the change in electrochemical potential by the electronic device, whereby the device sends an electrical signal to indicate via fill is completed.
Dependencies are inferred from the claim text.