Composite useful in photolithography
AssigneeMicroSi, Inc.
InventorsBruce F. Griffing, Paul R. West
Life of this patent
Estimating the term…
Abstract
The image of an object with opaque and transparent regions having a contrast less than the contrast threshold of a layer of photoresist when light of a predetermined wavelength to which the photoresist is sensitive is passed through the object and onto the layer of photoresist is enhanced in contrast by the provision of a contrast enhancing layer contiguous to the surface of the photoresist to a value above the contrast threshold of the photoresist. The contrast enhancing layer is constituted of an aryl nitrone compound mixed with a suitable binder.
Claims8
A composite useful in making microelectronic circuits comprising a silicon wafer, a photoresist formed on the surface of the silicon wafer and a photobleachable layer that has been formed in situ upon the surface of the photoresist opposite the silicon wafer by spin casting a mixture thereon comprising by weight
- (A) 100 parts of organic solvent,
- (B) 1 to 30 parts of inert organic polymer binder, and
- (C) 1 to 30 parts of an ultraviolet radiation sensitive photobleachable organic compound.
Dependencies are inferred from the claim text.