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US 5,087,593 AGranted
Preparation of titanium nitride from organometallic precursors
AssigneeFord Motor Company
InventorChaitanya K. Narula
Life of this patent
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Abstract
A titanium tetrahalide is reacted with at least one disilazane to prepare a titanium-containing organometallic precursor, which is thereafter pyrolyzed to form crystalline titanium nitride.
Claims20
A process for preparing titanium nitride, consisting essentially of the steps of:
- (A) contacting a titanium tetrahalide with at least one disilazane, at a temperature and for a period of time sufficient to prepare a titanium-containing organometallic precursor;
- and
- (B) heating the precursor to a temperature and for a period of time sufficient to pyrolyze the precursor.
A process for preparing titanium nitride, consisting essentially of the steps of:
- (A) contacting titanium tetrachloride with at least one disilazane including hexamethyldisilazane, the mole ratio of titanium tetrachloride to disilazane being from about 1:1 to about 1:2, optionally in the presence of a solvent, at a temperature from about -100.degree. C. to about 100.degree. C. and for a period of time sufficient to prepare a titanium-containing organometallic precursor;
- and
- (B) heating the precursor to a temperature at least about 600.degree. C. and for a period of time sufficient to pyrolyze the precursor.
A process for applying a layer of titanium nitride to a surface of a substrate, comprising the steps
- (A) contacting a titanium tetrahalide with at least one disilazane, at a temperature and for a period of time sufficient to prepare a titanium-containing organometallic precursor;
- (B) applying the organometallic precursor to the surface of the substrate;
- and
- (C) heating the precursor to a temperature and for a period of time sufficient to pyrolyze the precursor.
1 more element
A process for applying a layer of titanium nitride to a surface of a substrate, consisting essentially of the steps of:
- (A) contacting titanium tetrachloride with at least one disilazane including hexamethyldisilazane, the mole ratio of titanium tetrachloride to disilazane being from about 1:1 to about 1:2, optionally in the presence of a solvent, at a temperature from about -100.degree. C. to about 100.degree. C. and for a period of time sufficient to prepare a titanium-containing organometallic precursor;
- (B) applying the organometallic precursor to the surface of the substrate;
- and
- (C) heating the precursor to a temperature of at least about 600.degree. C. and for a period of time sufficient to pyrolyze the precursor.
1 more element
Dependencies are inferred from the claim text.