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US 5,076,905 AGranted
Electrophoretic deposition apparatus
AssigneeChloride Silent Power Limited
InventorGlyn Atherton
Life of this patent
Estimating the term…
Abstract
It has hitherto been difficult to achieve the even deposition of a cup-shaped body from slurry flowing around a mandrel. This specification discloses a deposition apparatus including control means providing a substantially uniform slurry flow rate over all surfaces of the mandrel to give uniform deposition.
Claims5
An apparatus for use in the electrophorectic deposition of a cup-shaped body from a slurry, comprising:
- a chamber constituting a first electrode and having a slurry inlet disposed at a lower end of said chamber, a first slurry outlet disposed at an upper end of said chamber and a second slurry outlet disposed at said lower end of said chamber;
- a mandrel constituting a second electrode and having an outer surface and being mounted in said chamber to define a space between said outer surface of said mandrel and an inner surface of said chamber, said first slurry outlet being disposed at an upper end of said space and surrounding said mandrel, and said second slurry outlet being disposed below a bottom face of said mandrel and having a mouth extending over substantially the whole area of said bottom face of said mandrel;
- and
- mesh member mounted over said mouth of said second outlet for controlling a flow of slurry from said slurry inlet to said first and second slurry outlets to achieve a substantially uniform slurry flow rate over all surfaces of said mandrel on which said cup-shaped body is to be deposited.
1 more element
Dependencies are inferred from the claim text.