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US 5,062,446 AGranted
Intelligent mass flow controller
AssigneeSematech, Inc.
InventorRichard L. Anderson
Life of this patent
Estimating the term…
Abstract
An intelligent mass flow controller for controlling the mass flow of gas to a semiconductor processing chamber. A sensing circuit measures a difference in temperature across a sensing tube and translates this difference to adjust a valve for controlling the mass flow. A microcontroller which includes a CPU, signal processing and software routines continually monitors the various parameters and provide "on the fly" corrections, as well as providing diagnostics and record retention.
Claims18
An apparatus for controlling a mass flow of a gas for use in semiconductor processing comprising:
- gas metering means having laminar flow coupled to receive said gas at its inlet and for providing a metered flow of said gas at its outlet;
- regulating means coupled to said metering means for regulating said flow of said gas provided at said outlet of said metering means;
- flow sensing means coupled to said metering means to sense said flow of said gas through said metering means;
- a temperature sensor coupled to the inlet of said gas metering means to measure temperature of said gas entering said gas metering means;
- a pressure sensor coupled to the inlet of said gas metering means to measure pressure of said gas entering said gas metering means;
- processing means coupled to receive gas flow information from said sensing means which is indicative of the flow of said gas and coupled to receive temperature and pressure information from said temperature and pressure sensors;
- said processing means also coupled to provide a control signal to said regulating means for controlling a position of said regulating means to provide a desired gas flow from said regulating means;
- said processing means further including a software routine stored in its memory for automatically processing said gas flow, temperature and pressure information and adjusting said gas flow based on said temperature and pressure information to correct for ambient variations in order to maintain a selected mass of said gas to flow;
- said processing means also including a calibration software routine to provide automatic, in-situ, in process calibration of said gas metering means during initialization of said apparatus.
6 more elements
A mass flow controller (MFC) for controlling a mass flow of a gas being introduced into a device utilized for semiconductor processing comprising:
- a gas flow meter having laminar flow coupled to received said gas at its inlet and providing a metered flow of said gas at its outlet;
- a flow valve coupled to said gas flow meter for regulating said flow of said gas provided as a gas flow output to said device;
- a sensing circuit coupled to said gas flow meter to sense said flow of said gas through said gas flow meter;
- a temperature sensor coupled to the inlet of said gas flow meter to measure temperature of said gas entering said gas flow meter;
- a pressure sensor coupled to the inlet of said gas flow meter to measure pressure of said gas entering said gas flow meter;
- a processor coupled to receive a signal from said sensing circuit which signal is indicative of the rate of flow of said gas and coupled to receive temperature and pressure information from said temperature and pressure sensors;
- said processor also coupled to provide a control signal to said flow valve for controlling a position of said flow valve to provide a desired gas flow from said flow valve;
- said processor further including a software routine stored in its memory for automatically processing said gas flow, temperature and pressure information and adjusting said gas flow based on said temperature and pressure information to correct for density variations of said gas at said inlet in order to maintain a selected mass of said gas to flow to said device;
- said processor also including a calibration software routine to provide automatic, in-situ, in process calibration of said flow valve during initialization of said MFC.
6 more elements
A mass flow controller (MFC) which is self-contained for controlling a mass flow of a gas being introduced into a semiconductor processing equipment comprising:
- a gas flow meter having laminar flow coupled to receive said gas at its inlet and providing a metered flow of said gas at its outlet;
- a flow valve coupled to said gas flow meter for regulating said flow of said gas provided as a gas flow output to said processing equipment;
- a sensing circuit coupled to said gas flow meter to sense said flow of said gas through said gas flow meter;
- said sensing circuit including a balanced bridge network to measure a difference of temperature across a flow sensing tube to determine said gas flow.
- a temperature sensor coupled to the inlet of said gas flow meter to measure temperature of said gas entering said gas flow meter;
- a pressure sensor coupled to the inlet of said gas flow meter to measure pressure of said gas entering said gas flow meter;
- a processor coupled to receive a signal from said sensing circuit which signal is indicative of the rate of flow of said gas and coupled to receive temperature and pressure information from said temperature and pressure sensors;
- said processor also coupled to provide a control signal to said flow valve for controlling a position of said flow valve to provide a desired gas flow;
- said processor further including a software routine stored in its memory for automatically processing said gas flow, temperature and pressure information and adjusting said gas flow based on said temperature and pressure information to correct for density variations of said gas at said inlet in order to maintain a selected mass of said gas to flow to said processing equipment;
- said software routine further including a calibration routine to provide automatic, in-situ, in process calibration of said flow valve during initialization of said MFC.
7 more elements
Dependencies are inferred from the claim text.