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US 5,059,448 AGranted
Rapid thermal process for obtaining silica coatings
AssigneeDow Corning Corporation
InventorsGrish Chandra, Theresa E. Martin
Life of this patent
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Abstract
The present invention is based on the discovery that rapid thermal processing (RTP) can convert hydrogen silsesquioxane resin coatings to ceramic silica coatings. This technique is especially valuable for the application of protective and dielectric layers on electronic devices.
Claims23
A method of applying a silica coating to a substrate comprising
- coating the substrate with a solution comprising hydrogen silsesquioxane resin and a solvent;
- evaporating the solvent to deposit a hydrogen silsesquioxane resin coating on the substrate;
- and
- subjecting the coated substrate to high intensity radiation comprising incoherent light in a spectral region selected from the group consisting of visible, infrared, ultraviolet and combinations thereof, in order to heat the coated substrate sufficiently to facilitate conversion of the hydrogen silsesquioxane resin coating to a silica coating.
1 more element
Dependencies are inferred from the claim text.