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US 5,055,679 AGranted
Surface analysis method and apparatus
AssigneeHitachi, Ltd.
InventorsKen Ninomiya, Keizo Suzuki
Life of this patent
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Abstract
A method of and an apparatus for analyzing a surface are disclosed, in which the intensity profile of a probe beam at the surface of a sample is measured, the intensity distribution of a detection signal along the surface of the sample is measured by scanning the surface of the sample with the probe beam, and mathematical transformation is carried out for each of the measured intensity profile and the measured signal-intensity distribution, to make surface analysis with high resolution.
Claims34
A method of analyzing a surface by using a probe beam, comprising the steps of:
- measuring the intensity profile of a probe beam at the surface of a sample;
- measuring the distribution of a detected signal along the surface of the sample by scanning the surface of the sample with the probe beam;
- and
- carrying out mathematic transformation for each of the intensity profile and the distribution of the detected signal.
1 more element
An apparatus for analyzing a surface, comprising:
- means for generating a probe beam;
- means for irradiating the surface of a sample with the probe beam;
- means for measuring the intensity profile of the probe beam at the surface of the sample;
- means for scanning the surface of the sample with the probe beam;
- means for detecting a signal caused by irradiating the surface of the sample with the probe beam, and for measuring the distribution of the signal along the surface of the sample;
- and
- means for carrying out mathematical transformation for each of the measured intensity profile and the measured signal distribution.
4 more elements
Dependencies are inferred from the claim text.