Deposition heaters
OwnerLoren A. Chowinventor
Life of this patent
Estimating the term…
Abstract
A gaseous deposition source for providing a deposition material that emanates from a crucible having mulitple thin film heating elements formed thereon, with each adjacent pair being separated by an insulating layer therebetween. A gaseous deposition source can have a crucible with a cover thereon with one or more apertures therein and with thin film heating elements on that cover about such apertures. A substrate heater may be used formed of thin film heating elements provided on a base.
Claims35
A material deposition source which can provide a gaseous material flow through a plurality of apertures from a material provided therein in an initial phase, said source comprising:
- a crucible means having a containment shell means within which said material in said initial phase can be selectively placed, said containment shell means having a flow opening therein;
- and
- an aperture cover means which can be fitted with respect to said crucible means to be over said flow opening in said containment shell means, said aperture cover means having an electrically insulating layer with a plurality of apertures therethrough each of a selected orientation and cross sectional area and further having formed thereon about and between selected ones of said apertures a first thin film electrical heating element to permit maintaining selected temperatures about those said apertures.
A material deposition source which can provide a gaseous material flow through an aperture from a material provided therein in an initial phase, said source comprising:
- a crucible means having a containment shell means within which said material in said initial phase can be selectively placed, said containment shell means having a flow opening therein;
- and
- an aperture cover means which can be fitted with respect to said crucible means to be over said flow opening in said containment shell means, said aperture cover means having an aperture therethrough in a portion thereof extending substantially into an interior region of said crucible means and further having formed thereon about said aperture a first thin film electrical heating element to permit maintaining selected temperatures about said aperture.
A material deposition source which can provide a gaseous material flow from a material provided therein in an initial phase, said source comprising:
- a crucible means having a containment shell means within which said material in said initial phase can be selectively placed, said containment shell means having a flow opening therein;
- a first thin film electrical heating element supported by and about said containment shell means by adhering thereto through temperatures sufficient to provide said gaseous material flow and situated so as to be able to heat interior portions of said containment shell means and any of that said material placed therein;
- and
- a second thin film electrical heating element supported by and about said containment shell means over said first thin film heating element but separated therefrom by an insulating layer at least partly adherent to said containment shell means, said first and second thin film electrical heating elements being capable of heating said material to a temperature sufficient to cause vaporization of said material.
Dependencies are inferred from the claim text.