Processes for restoring amorphous silicon imaging members
AssigneeXerox Corporation
InventorsDamodar M. Pai, Santokh S. Badesha
Life of this patent
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Abstract
A process for restoring imaging members, which comprises (1) providing, subsequent to its utilization and removal from an electrophotographic imaging device, an amorphous silicon photoconductive imaging member with a protective overcoating; (2) contacting this member with a fluorine containing composition for an effective time period enabling the removal of the protective layer; (3) washing and drying the surface of the resulting imaging member; and (4) subsequently depositing a protective layer thereover.
Claims35
A process for restoring imaging members, which comprises (1) providing, subsequent to its utilization and removal from an electrophotographic imaging device, an amorphous silicon photoconductive imaging member with a protective overcoating;
- (2) contacting this member with a fluorine containing composition for an effective time period enabling the removal of the protective layer;
- (3) washing and drying the surface of the resulting imaging member;
- and (4) subsequently depositing a protective layer thereover, and wherein the fluorine containing composition is selected from the group consisting of hydrofluoric acid and hexafluorides.
A process for restoring imaging members, which comprises (1) providing, subsequent to its utilization and removal from an electrophotographic imaging apparatus, a hydrogenated or halogenated amorphous silicon imaging member with a protective overcoating;
- (2) contacting this member with a fluorine containing composition for an effective time period enabling the removal of the protective layer;
- (3) washing and drying the surface of the resulting imaging member;
- and (4) subsequently depositing a protective layer thereover, and wherein the fluorine containing composition is selected from the group consisting of hydrofluoric acid and hexafluorides.
A process for restoring hydrogenated or halogenated amorphous silicon imaging members, which comprises (1) obtaining, subsequent to its utilization in and removal from an electrophotographic imaging member, a hydrogenated or halogenated amorphous silicon imaging member with a protective overcoating;
- (2) subsequently contacting this member with fluorine containing compositions for a period of from about one minute to about 240 minutes enabling the removal of the protective layer;
- (3) washing and drying the surface of the resulting imaging member;
- and (4) subsequently depositing a protective layer thereover thereby enabling the resulting member to be reincorporated into the electrophotographic imaging apparatus and permitting the achievement of images of increased resolution with substantially no white spots as compared to the removed member, and wherein the fluorine containing composition is selected from the group consisting of hydrofluoric acid and hexafluorides.
A process for restoring halogenated amorphous silicon imaging members which comprises (1) obtaining a hydrogenated or halogenated amorphous silicon member with a protective overcoating subsequent to its utilization in and removal from an electrophotographic imaging device;
- (2) thereafter contacting this member with hydrogen fluoride vapors for a period of from about one minute to about 240 minutes thereby enabling the removal of the protective layer;
- (3) washing and drying the surface of the resulting imaging member;
- and (4) subsequently depositing a protective layer thereover enabling an imaging member that can be reincorporated into an electrophotographic imaging device, and wherein there are obtained images of increased resolution with substantially no white spots as compared to the removed hydrogenated or halogenated member, and wherein the fluorine containing composition is selected from the group consisting of hydrofluoric acid and hexafluorides.
A process for restoring imaging members, which comprises (1) providing, subsequent to its utilization and removal from an electrophotographic imaging device, an amorphous silicon imaging member with a protective overcoating;
- (2) contacting this member with a fluorine containing composition for an effective time period enabling the removal of the protective layer;
- and (3) washing and drying the surface of the resulting imaging member, and wherein the fluorine containing composition is selected from the group consisting of hydrofluoric acid and hexafluorides.
A process for restoring hydrogenated or halogenated amorphous silicon imaging members, which comprises (1) obtaining, subsequent to its utilization in and removal from an electrophotographic imaging member, a hydrogenated or halogenated amorphous silicon imaging member with a protective overcoating;
- (2) subsequently contacting this member with fluorine containing compositions for a period of from about one minute to about 240 minutes enabling the removal of the protective layer;
- and (3) washing and drying the surface of the resulting imaging member.
Dependencies are inferred from the claim text.