Method of fabricating an image pick-up tube and target section used therewith

A television camera using an image pick-up tube comprising a target section including at least a conductive film and a photoconductive film on a substrate for photo-electric conversion, and an electron beam scanning system for reading a signal from the target section, wherein at least a part of the surface area outside the effective scanning region of the electron beam scanning side of the target section is formed of a secondary electron emission dampening porous layer.

An X-ray image analysis system using an image pick-up tube comprising a target section including at least a conductive film and a photoconductive film on a substrate for photo-electric conversion, and an electron beam scanning system for reading a signal from the target section, wherein at least a part of the surface area outside the effective scanning region of the electron beam scanning side of the target section is formed of a secondary electron emission dampening porous layer.

A method of fabricating a target section including at least a conductive film and a photoconductive film on a substrate for photo-electric conversion, comprising the steps of forming a predetermined porous layer over the entire area on the electron beam scanning side of the photoconductive film of said target, and superposing a porous layer higher in porosity than said predetermined porous layer on at least a part of the surface area outside the effective scanning region of electron beam in a layer above said predetermined layer thereby to form a secondary electron emission dampening layer.

A method of fabricating a target section including at least a conductive film and a photoconductive film on a substrate for photo-electric conversion, comprising the steps of forming a predetermined porous layer over the entire area of the electron beam scanning side on said photoconductive film, and superposing a thin film of C on at least a part of the surface area outside the effective scanning region of electron beam of said predetermined porous layer thereby to form a secondary electron emission dampening layer.

A method of fabricating a target section including a conductive film and a photoconductive film on a substrate for photo-electric conversion, comprising the steps of forming a porous layer by arranging on said photoconductive film a mesh mask having a part thereof corresponding to at least a part of the surface area outside the effective scanning region, said part having a higher transmittance than the effective scanning region of electron beam, and forming a secondary electron emission dampening layer on said part higher in transmittance.

A method of fabricating a target section including at least a conductive film and a photoconductive film on a substrate for photo-electric conversion, comprising the steps of forming a predetermined porous layer over the entire surface area of said photoconductive film, removing a part of said porous layer corresponding to the surface area inside the effective scanning region of electron beam, and laminating a different porous layer over the entire area of the electron beam scanning side thereby to form a secondary electron emission dampening layer on the surface area outside the effective scanning region.