Plasma CVD apparatus
AssigneeNational Research Institute for Metals
InventorsIsao Nakatani, Takao Furubayashi
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Abstract
A plasma CVD apparatus having a rotary vacuum reaction vessel, a starting gas introducing port, an ambient gas introducing port, an exhaust port, electrodes or an induction coil for applying a high-frequency electric field, and a cooling pipe provided in the starting gas introducing port for cooling the starting gas introducing port, wherein the starting gas introducing port and the exhaust port are located in opposition to each other on a rotating axis of the reaction vessel.
Claims19
A plasma CVD apparatus comprising:
- a rotatable plasma reaction vessel;
- a starting gas introducing pipe for introducing a starting gas thereinto;
- an ambient gas introducing pipe opening into said reaction vessel for introducing an ambient gas thereinto;
- an exhaust pipe opening out of said reaction vessel;
- means for applying a high frequency electric field to the interior of said reaction vessel;
- a starting gas blowing port means on said starting gas introducing pipe within said reaction vessel;
- and
- a cooling means in direct heat exchange relation with said port means for cooling said port means wherein said starting gas introducing pipe and said exhaust pipe are located in opposition to each other on a rotating axis of said reaction vessel.
A plasma CVD apparatus comprising a rotary vacuum reaction vessel, a starting gas introducing port means, an ambient gas introducing port means, an exhaust port means, electrodes or an induction coil for applying a high-frequency electric field, and a cooling means provided in said starting gas introducing port means for cooling said starting gas introducing port means, wherein said starting gas introducing port means and said exhaust port means are located in opposition to each other on a rotating axis of said reaction vessel.
Dependencies are inferred from the claim text.