Method of removing residual corrosive compounds by plasma etching followed by washing
AssigneeHitachi, Ltd.
InventorsYoshinao Kawasaki, Hironobu Kawahara, Yoshiaki Sato, Ryooji Fukuyama, Kazuo Nojiri, Yoshimi Torii
Life of this patent
Estimating the term…
Abstract
A sample is plasma etched and then treated with a second plasma to remove residual corrosive compounds formed by the etching plasma. Removal of the residual corrosive compounds and prevention of corrosion is improved by washing the surface of the sample after the second plasma treatment with at least one liquid in order to effect at least one of (a) removal of the residual corrosive compounds and (b) passivation of the surface, the step of washing is followed by drying the sample.
Claims14
A method of processing a sample comprising the steps of:
- (i) etching the sample by means of a first plasma formed in a gas atmosphere,
- (ii) after step (i), treating the sample by means of a second plasma to remove residual corrosive compounds formed in step (i), said second plasma being formed in a gas atmosphere different from the gas atmosphere in which the first plasma is formed,
- (iii) contacting a surface of said sample etched in step (i) and treated in step (ii) with at least one liquid which effects at least one of (a) removal of residual corrosive compounds formed in step (i) which were not removed in step (ii) and (b) passivation of said surface etched in step (i) and treated in step (ii), and
- (iv) after step (iii), drying the sample.
A method of substantially freeing a plasma-etched sample of residual corrosive compounds produced when the sample was etched, comprising the steps of:
- (i) treating a plasma-etched surface of the sample by means of a plasma which removed from said surface residual corrosive compounds produced when the sample was plasma etched,
- (ii) washing the surface of said sample treated in step (i) with a liquid which removes residual corrosive compounds formed when the sample was etched which were not removed in step (i), and
- (iii) drying said sample after step (ii).
Dependencies are inferred from the claim text.