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US 4,999,699 AGranted
Solder interconnection structure and process for making
AssigneeInternational Business Machines Corporation
InventorsFrederick R. Christie, Kostas I. Papathomas, David W. Wang
Life of this patent
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Abstract
Solder interconnection whereby the gap created by solder connections between a carrier substrate and semiconductor device is filled with a composition obtained from curing a preparation containing a cycloaliphatic polyepoxide and/or curable cyanate ester or prepolymer thereof; filler having a maximum particle size of 31 microns and being at least substantially free of alpha particle emissions.
Claims21
A solder interconnection for forming connections between an integrated semiconductor device and a carrier substrate comprising
- a plurality of solder connections that extend from the carrier substrate to electrodes on said semiconductor device to form a gap between said carrier substrate and the semiconductor device, wherein said gap is filled with a composition obtained from curing a composition containing:
- A. a binder selected from the group of cycloaliphatic polyepoxide, cyanate ester, prepolymer of cyanate ester and mixtures thereof, said binder having a viscosity at room temperature of no greater than about 1,000 centipoise;
- B. filler having a maximum particle size of 31 microns and being substantially free of alpha particle emissions;
- wherein the amount of A is about 60 to about 25% by weight of the total of A and B and correspondingly, the amount of B is about 40 to about 75 percent by weight based upon the amount of A and B.
1 more element
Dependencies are inferred from the claim text.