Method for purifying impure aqueous hydrogen peroxide solution
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsYasuo Sugihara, Shigeki Shimokawa
Life of this patent
Estimating the term…
Abstract
A method for purifying an impure aqueous hydrogen peroxide solution, which comprises passing an impure aqueous hydrogen peroxide solution through (a) a cation exchange resin layer, a halogen-containing porous resin layer and an anion exchange resin layer in this order, or (b) a halogen-containing porous resin layer, a cation exchange resin layer and an anion exchange resin layer in this order, or (c) a halogen-containing porous resin layer and a cation/anion mixed-bed resin layer in this order to contact said solution with each resin.
Claims10
A method for purifying an impure aqueous hydrogen peroxide solution, which comprises passing an impure aqueous hydrogen peroxide solution through
- (a) a cation exchange resin layer, a halogen-containing porous resin layer and an anion exchange resin layer in this order, or
- (b) a haloge-containing porous resin layer, a cation exchange resin layer and an anion exchange resin layer in this order, or
- (c) a halogen-containing porous resin layer and a mixed resin layer consisting of a cation exchange resin and an anion exchange resin in this order to contact said solution with each resin.
Dependencies are inferred from the claim text.