Distributed ECR remote plasma processing and apparatus
AssigneeTexas Instruments Incorporated
InventorsMehrdad M. Moslehi, Steve S. Huang
Life of this patent
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Abstract
A distributed electron cyclotron resonance remote plasma processing apparatus and method which includes generating electron cyclotron resonance activated species in plasma formation regions distributed peripherally around, remote from the wafer processing chamber and in fluid communication with the main transfer chamber; containing the activated species using a microwave gas discharge and a magnetic field in the plasma formation regions; introducing the plasma streams to the main transfer chamber; creating a magnetic mirror in the main transfer chamber using a magnetic field; and introducing the species to the process chamber and to a face of the workpiece. Such an apparatus could use multiple energy/excitation sources.
Claims65
A distributed electron cyclotron resonance remote plasma processing apparatus, comprising:
- (a) a processing chamber;
- (b) a main transfer chamber in fluid communication with the processing chamber;
- (c) a plurality of peripheral magnet bars substantially surrounding the main transfer chamber;
- (d) a plurality of electron cyclotron resonance plasma formation regions peripherally distributed around the periphery of, remote from, and in fluid communication with the main transfer chamber;
- and
- (e) a plurality of magnet bars substantially surrounding external surfaces of said plasma formation regions.
A distributed electron cyclotron resonance remote plasma processing apparatus, comprising:
- (a) a processing chamber;
- (b) a main transfer chamber in fluid communication with the processing chamber;
- (c) a plurality peripheral magnet bars surrounding the main transfer chamber;
- (d) a toroidal plasma formation region of trapezoidal cross section around the periphery of, remote from, and in fluid communication with the main transfer chamber;
- (e) a plurality of magnet bars substantially surrounding external surfaces of the plasma formation region;
- and
- (f) a plurality of plasma generators peripherally distributed in the plasma formation region.
A distributed electron cyclotron resonance remote plasma processing apparatus, comprising:
- (a) a processing chamber;
- (b) a main transfer chamber in fluid communication with the processing chamber;
- (c) a first plurality of permanent magnets surrounding the main transfer chamber;
- (d) a plurality of plasma formation regions peripherally distributed around the main transfer chamber;
- (e) a second plurality permanent magnets surrounding the external surfaces of the plasma formation regions;
- (f) a plurality of peripherally distributed encapsulated antennae;
- and
- (g) a plurality of gas injectors each positioned in the vicinity of one of the plurality of microwave antennae.
A method for manufacturing an integrated circuit device, comprising:
- (a) generating electron cyclotron resonance activated species in plasma formation regions distributed peripherally, remote from and in fluid communication with a main transfer chamber;
- (b) containing the activated species using a magnetic field in the plasma formation regions;
- (c) introducing the activated species to the main transfer chamber;
- (d) creating a magnetic mirror in the main transfer chamber using a magnetic field;
- and
- (e) introducing the activated species to the process chamber and to a face of the workpiece.
Dependencies are inferred from the claim text.