Lateral heterojunction bipolar transistor (LHBT) and suitability thereof as a hetero transverse junction (HTJ) laser
AssigneeXerox Corporation
InventorRobert L. Thornton
Life of this patent
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Abstract
A lateral heterojunction bipolar transistor (LHBT) comprises emitter and/or collector regions forming a p-n heterojunctions at the emitter/base junction and at the collector/base junction with a planar base region wherein at least the emitter region is formed by employing impurity induced disordering (IID) to produce emitter or collector region of wider bandgap than the base region. The lateral heterojunction bipolar transistor of this invention can also double as a hetero transverse junction (HTJ) laser.
Claims20
A heterojunction bipolar transistor comprising a plurality of semiconductor layers formed on a support, one of said layers having a narrower bandgap than immediately adjacent layers thereto, an impurity induced disordered region formed in a portion of said adjacent and narrow bandgap layers, a second region formed in another portion of said adjacent and narrow bandgap layers in laterally spaced relation to said impurity induced disordered region, said disordered region of a wider bandgap than said narrow bandgap layer and forming a heterojunction between said disordered region and a portion of said narrow bandgap layer remaining between said regions, said disordered region comprising the emitter of said transistor doped a first conductivity type, said second region comprising a collector doped said first conductivity type, said narrow bandgap layer undisordered portion between said regions comprising the base of said transistor doped a second conductivity type.
A heterojunction bipolar transistor comprising a plurality of semiconductor layers formed on a support, one of said layers having a narrower bandgap than immediately adjacent layers thereto, a first impurity induced disordered region formed in a portion of said adjacent and narrow bandgap layers, a second impurity induced disordered region formed in another portion of said adjacent and narrow bandgap layers in laterally spaced relation to said first impurity induced disordered region, said disordered regions of a wider bandgap than said narrow bandgap layer and forming a heterojunction between said disordered regions and a portion of said narrow bandgap layer remaining between said regions, one of said disordered regions comprising the emitter of said transistor doped a first conductivity type, the other of said disordered regions comprising the collector of said transistor doped said first conductivity type, said narrow bandgap layer undisordered portion comprising the base of said transistor doped a second conductivity type.
A heterojunction bipolar transistor comprising:
- (a) a first layer doped a first conductivity type on a support,
- (b) a second layer doped said first conductivity type on said first layer,
- (c) a third layer doped said first conductivity type on said second layer,
- (d) said first and third layers comprising a compound semiconductor having a wider bandgap than said second layer,
- (e) a collector region formed in said first, second and third layers doped a second conductivity type,
- (f) an impurity induced disordered region formed in said first, second and third layers of said second conductivity type in laterally spaced relation to said collector region wherein said disordered region comprises an enhanced layer interdiffusion alloy comprising said first, second and third layers,
- (g) said disordered region of a wider bandgap than said second layer and forming a heterojunction between said disordered region and an undisordered portion of said second layer remaining between said regions,
- (h) said disordered region comprising the emitter of said transistor and said second layer undisordered portion comprising the base of said transistor.
A heterojunction bipolar transistor comprising:
- (a) a first base layer of a first conductivity type on a support,
- (b) a second base layer of said first conductivity type on said first base layer,
- (c) a third base layer of said first conductivity type on said second base layer,
- (d) said first and third base layers comprising a compound semiconductor having a wider bandgap than said second base layer,
- (e) a collector region formed in said first, second and third layers doped with an impurity of a second conductivity type,
- (f) at least one impurity induced disordered region formed in said first, second and third layers in laterally spaced relation to said collector region wherein said disordered region comprises an impurity enhanced layer interdiffusion alloy comprising said first, second and third layers
- (g) said disordered region having a wider bandgap than said second base layer and forming a heterojunction between said disordered region and an undisordered portion of said second base layer between said regions,
- (h) said disordered region of said second conductivity type and comprises the emitter of said transistor and said second base layer undisordered portion comprises the base of said transistor.
A heterojunction bipolar transistor comprising:
- (a) a first base layer of a first conductivity type on a support,
- (b) a second base layer of said first conductivity type on said first base layer,
- (c) a third base layer of said first conductivity type on said second layer,
- (d) said first and third base layers comprising a compound semiconductor having a wider bandgap than said second base layer,
- (e) a pair of impurity induced disordered regions formed in laterally spaced relation in said first, second and third layers wherein said laterally spaced disordered regions comprise an impurity enhanced layer interdiffusion alloy comprising said first, second and third layers,
- (f) said disordered regions having a wider bandgap than said second base layer and forming heterojunctions between said disordered regions and an undisordered portion of said second base layer remaining between said regions,
- (g) the impurity employed in performing said disordering of a second conductivity type,
- (h) said laterally spaced disordered regions comprising the emitter and collector of said transistor and said second base layer undisordered portion comprising the base of said transistor.
A heterojunction bipolar transistor/laser device comprising a plurality of semiconductor layers formed on a support, one of said layers having a narrower bandgap than immediately adjacent layers thereto, a first impurity induced disordered region formed in a portion of said adjacent and narrow bandgap layers, a second impurity induced disordered region formed in another portion of said adjacent and narrow bandgap layers in laterally spaced relation to said first impurity induced disordered region, said disordered regions of a wider bandgap than said narrow bandgap layer and forming a heterojunction between said disordered regions and a portion of said narrow bandgap layer remaining between said regions, one of said disordered regions comprising the emitter of said transistor doped a first conductivity type, the other of said disordered regions comprising the collector of said transistor doped said first conductivity type, said narrow bandgap layer undisordered portion comprising the base of said transistor doped a second conductivity type thereby forming p-n junctions at the interfaces of said emitter/base and collector/base, means to forward bias said emitter and reverse bias said collector to operate said device in a transistor mode and means to forward bias both said emitter and collector to operate said device in a laser mode wherein said base functions as the active region for stimulated light emission.
A heterojunction laser comprising a plurality of semiconductor layers formed on a support, one of said layers having a narrower bandgap than immediately adjacent layers thereto, a first impurity induced disordered region formed in a portion of said adjacent and narrow bandgap layers, a second impurity induced disordered region formed in another portion of said adjacent and narrow bandgap layers in laterally spaced relation to said first impurity induced disordered region, and a barrier region electrically isolating said disordered regions, said disordered regions of a wider bandgap than said narrow bandgap layer and forming a heterojunction between said disordered regions and a portion of said narrow bandgap layer remaining between said regions, said disordered regions doped a first conductivity type, said narrow bandgap layer undisordered portion comprising the active region of said laser and consisting of material of a second conductivity type to allow for effective injection of carriers of said second conductivity type into said active region, and means to independently forward bias at least one of said disordered regions to bring about stimulated light emission in said active region.
Dependencies are inferred from the claim text.