Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl groups, process for their preparation, and light-sensitive mixture containing the compounds
AssigneeHoechst Aktiengesellschaft
InventorsReinhard Doenges, Hans Ruckert, Ulrich Geissler, Hartmut Steppan
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Abstract
Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.
Claims13
A compound of the formula I ##STR14## wherein L represents a hydrogen atom or a substituent of the formula CO--RI(CX.sub.3).sub.m,
- M represents a substituted or unsubstituted alkylene radical or alkenylene radical or a 1,2-arylene radical,
- Q represents a sulfur, selenium or oxygen atom, a dialkylmethylene group, an alken-1,2-ylene radical, a 1,2-phenylene radical or an N-R group, whereby M+Q together form 3 or 4 ring members,
- R represents an alkyl, aralkyl or alkoxyalkyl radical,
- R.sup.1 is a carbocyclic aromatic or heterocyclic aromatic group, and
- X is a chlorine, bromine or iodine atom, and m=1 or 2.
Dependencies are inferred from the claim text.