Method and apparatus for detecting foreign particle

A method for detecting a foreign particle comprising the steps of:

• radiating an ultraviolet light beam in the form of a focused light spot having a wavelength not larger than 380 nm, to an x-ray exposure mask comprising a circuit pattern formed on a substrate and an organic protective film formed on the circuit pattern;
• allowing said focused light beam and the x-ray exposure mask to scan relatively to each other;
• allowing said ultraviolet light beam to be absorbed by said organic protective film of the x-ray exposure mask;
• condensing diffracted light from the foreign particle present on the organic protective film by means of an integrating sphere;
• sensing the condensed light by means of an optoelectro transducer to convert the condensed light into an electric signal;
• and
• detecting the foreign particle on said organic protective film in accordance with said electric signal.

A method for detecting a foreign particle comprising the steps of:

• radiating an ultraviolet light beam to a sample comprising at least one of a circuit pattern and a wiring pattern formed on a substrate, and an organic protective film formed on the pattern;
• allowing said ultraviolet light to be absorbed by said organic protective film,
• separating low-order diffracted light and high-order diffracted light both produced from a foreign particle on a surface of said organic protective film, from each other;
• condensing the high-order diffracted light by means of an integrating sphere;
• sensing the condensed light by means of an optoelectro transducer to convert the condensed light into an electric signal;
• and
• detecting the foreign particle on the organic protective film in accordance with said electric signal.

An apparatus for detecting a foreign particle comprising;

• means for radiating an ultraviolet light beam having a wavelength not larger than 380 nm in the form of a spot to a sample comprising at least one of a circuit pattern and a wiring pattern formed on a substrate and an organic protective film formed on the pattern so as to absorb the ultraviolet light beam into the organic protective film of the sample;
• an integrating sphere for condensing diffracted light produced from the foreign particle present on the protective film of said sample which absorbs the ultraviolet light beam;
• an optoelectro transducer for converting the condensed diffracted light into an electric signal;
• means for scanning said spot of the ultraviolet light beam for radiation, said integrating sphere and said optoelectro transducer in relative relation to said sample;
• and
• wherein the foreign particle on said organic protective film is detected in accordance with said electric signal obtained from said optoelectro transducer by absorbing the radiation ultraviolet light beam into the organic protective film.

An apparatus for detecting a foreign particle comprising:

• means for radiating an ultraviolet light beam to a sample comprising at least one of a circuit pattern and a wiring pattern formed on a substrate and an organic protective film formed on the pattern so as to absorb the ultraviolet light beam into the organic protective film of the sample;
• a light shielding means for separating low-order diffracted light and high-order diffracted light, both produced from a foreign particle on the surface of the organic protective film, from each other;
• a light condensing optical system for condensing high-order diffracted light separated by said light shielding means;
• an optoelectro transducer for converting the light condensed by said light condensing optical system into an electric signal;
• and
• wherein the foreign particle is detected in accordance with the basis of the electric signal provided from said optoelectro transducer.