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US 4,963,390 AGranted
Metallo-organic solution deposition (MOSD) of transparent, crystalline ferroelectric films
AssigneeThe Aerospace Corporation
InventorsRussell A. Lipeles, Dianne J. Coleman
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Abstract
An improved process to deposit transparent, crystalline, ferroelectric films from metallo-organic solutions on platinum, glass, quartz, and sapphire substrates is disclosed. The use of this process results in a significant improvement in the transparency of perovskite, ferroelectric lead titanate (PT), lead zirconate titanate (PZT) and doped-PZT films (e.g. films doped with lanthanum, PLZT).
Claims7
An improved coating deposition process for transparent, ferroelectric films up to 5mm thick consisting of the following steps:
- a. mixing liquid state metallo-organic starting materials consisting of at least one alkoxide or carboxylic acid salt of the metals selected from a group consisting of barium, strontium, lead, lanthanum or lithium or a from a group consisting of zirconium, titanium or niobium to form a coating solution;
- b. spinning, dipping, or spraying the coating solution on the substrate to be coated;
- c. drying the coated substance at low temperature in the range of 100-200.degree. C. in air or a vacuum, thereby removing low boiling solvent molecules;
- d. rapidly densifying the coated substrate at moderate temperature (400-600.degree. C, thereby forming an amorphous film;
- e. repeatingthe above steps until a desired coating thickness is obtained;
- and
- f. annealing the thus formed film at a temperature in the range 525-800.degree. C. to obtain a transparent ferroelectric oxide film with a controlled grain size.
4 more elements
Dependencies are inferred from the claim text.