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AssigneeMicron Technology, Inc.
InventorsRuojia R. Lee, D. M. Durcan
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The present invention constitutes an improvement of the Local Encroachment Reduction (LER) process developed by Tyler Lowrey at Micron Technology, Inc. of Boise, Idaho. LER consists of selectively etching a portion of the field oxide which has encroached into a DRAM cell's active area and then subjecting the cell to a high-energy boron implant to maintain adequate active area isolation. Although the boron implant effectively decreases the width of the depletion region between n+ active areas and p+ substrate, it has the undesirable effect of reducing the breakdown voltage at the n-p junctions in the bird's beak regions at the edges of the active regions, thus increasing the cell's susceptibility to gated-diode breakdown following creation of the cell plate. The present invention solves this problem by creating a graded junction in the bird's beak regions of the cell. The graded junction reduces the electric field intensity in the junction region, resulting in an increase in the breakdown voltage. The graded junction also minimizes the effect of gated-diode breakdown and band-band tunneling leakage.
A process for reducing the electric field effect in the bird's beak region of a DRAM cell following expansion of the cell's active area, which had previously been implanted with arsenic to create N+ regions, through local encroachment reduction, said process comprising the step of blanket implanting the active are with phosphorus to create N- regions between the N+ regions and the edge of the field oxide.
A process for creating a graded N-P junction within a DRAM cell, the capacitive region of which has been expanded through local encroachment reduction, said process comprising the following steps which begin subsequent to the conventional creation of field oxide regions having an underlying channel-stop implant of p-type material, creation of a gate oxide layer, creation of a transistor gate for the cell by etching a polysilicon layer, the self-aligned implant of lightly-doped (N-) source and drain regions, and creation of transistor gate sidewall spacers by anisotropically etching a spacer oxide layer, and prior to the deposition of the cell dielectric layer, said process comprising the following steps:
Dependencies are inferred from the claim text.