Deposition of boron-containing films from decaborane
AssigneeSyracuse University
InventorsJames T. Spencer, Peter A. Dowben, Yoon G. Kim
Life of this patent
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Abstract
Depopsition of a boron nitride film is carried out by introducing decaborane and dry nitrogen or ammonia into a plasma-assisted chemical vapor deposition chamber. The nitrogen or ammonia partial pressure should provide an excess over the decarborane pressures for example 200 milliTorr of N.sub.2 or NH.sub.3 and 50 MilliTorr of B.sub.10 H.sub.14. Other film layers can also be produced starting from decaborane.
Claims12
A process for depositing a boron nitride film onto a suitable substrate comprising:
- supplying into a chamber that contains the substrate a gaseous mixture of decaborane and a nitrogen-based gas whose molecules contain at least one nitrogen atom, wherein said nitrogen-based gas is provided at a partial pressure that is several times as high as the partial pressure of said decaborane, and
- energizing the gaseous mixture in the chamber sufficiently to disassociate the nitrogen atoms from said molecules and to disassociate boron atoms from the decaborane, which then combine as said boron nitride film on said substrate.
A process for depositing a binary film of boron and one other element onto a suitable substrate, comprising
- supplying into a chamber that contains the substrate a gaseous mixture of decaborane and another gas whose molecules contain at least one atom of said other element, wherein said other gas is provided at a partial pressure that is several times as high as the partial pressure of said decaborane;
- and
- energizing said gaseous mixture in the chamber sufficiently to disassociate said atoms from said molecules and to disassociate said boron atoms from the decaborane, which combine as said binary film on said substrate.
A process for depositing a boron film onto a suitable substrate, comprising
- introducing into a chamber that contains said substrate decaborane gas, and
- energizing said decaborane gas at selected locations on said substrate sufficiently to disassociate the boron from the decaborane which deposits itself on said substrate at said selected locations.
Dependencies are inferred from the claim text.