Antistatic resin composition with transparency containing phosphonium sulphonate

Abstract

An antistatic resin composition with transparency contains 90-99.9 wt % of a synthetic resin selected from polycarbonate or polymethyl methacrylate and 0.1-10 wt % of a heat-resistant antistat containing phosphonium sulfonate shown by the general formula (I) below: ##STR1## where A is alkyl group with 1-36 carbon atoms, alkenyl group with 4-24 carbon atoms, phenyl group, phenyl group substituted by alkyl group with 1-18 carbon atoms, naphthyl group or naphthyl group substituted by alkyl group with 1-18 carbon atoms, R.sup.1, R.sup.2 and R.sup.3 are identical, each being an aliphatic hydrocarbon group with 1-8 carbon atoms or aromatic hydrocarbon group, and R.sup.4 is a hydrocarbon group with 1-18 carbon atoms.

Dependencies are inferred from the claim text.