Sputtering target and process for preparing the same

A high melting point metal silicide-based target for use as an electrode material or a wiring material in semi-conductor devices which comprises a fine textured non-stoichiometric material whose uranium and thorium contents are not more than 0.1 ppm, whose sodium and potassium contents are not more than 1 ppm, whose oxygen content is not more than 200 ppm, whose stoichiometric composition grains of MSi.sub.2, where M represents a high melting point metal, have a maximum grain size of 20 .mu.m, whose free silicon grains have a maximum grain size of 50 .mu.m, which has a density with respect to the theoretical density of 99% or higher, and which has a purity of 99.99% or higher.

A process for preparing a high melting point metal silicide-based sputtering target for use as an electrode material or a wiring material in semiconductor devices, which comprises mixing high purity, high melting point metal powder having particle sizes of about 15 .mu.m or less with an excess over a stoichiometric amount of high purity silicon powder having particle sizes of about 20 .mu.m or less, subjecting the resulting mixture to silicidizing reaction in a high vacuum, thereby obtaining a calcined product, placing the calcined product in a sealable vessel for compact pressing, sealing the vessel after evacuation of the vessel into a vacuum, and sintering the calcined product in a hot isostatic press while pressing to a density of 99% or higher with respect to the theoretical density.

A process for preparing a high melting point metal silicide-based sputtering target for use as an electrode material or a wiring material in semi-conductor devices, which comprises mixing ultra high purity, high melting metal powder obtained by subjecting high melting point metal powder having a purity of 99.99% or greater to reaction with a hydrogen fluoride gas in advance, thereby forming a metal fluoride, purifying the metal fluoride through distillation, thereby removing uranium, thorium, sodium and potassium therefrom, followed by ammoniation, oxidation, and successive reduction with high purity silicon powder, subjecting the mixture to silicidizing reaction in a high vacuum, thereby forming a calcined product, placing the calcined product in a sealable container for compact pressing, sealing the container after evacuation of the container to a vacuum, and sintering the calcined product in a hot isostatic press.

A process for preparing a high melting point metal silicide-based sputtering target for use as an electrode material or a wiring material in semi-conductor devices, which comprises mixing high density, high melting point metal powder having a purity of 99.99% or greater with an excess over stoichiometric amount of high purity silicon powder, subjecting the resulting mixture to silicidizing reaction in a high vacuum, thereby obtaining a calcined product, disintegrating the calcined product to powder having sizes of 30 mesh and under in an argon-sealed ball mill, placing the disintegrated powder in a sealable vessel for compact pressing, sealing the vessel after evacuation of the vessel into a vacuum, and sintering the calcined product in a hot isostatic press while pressing to a density of 99% or higher with respect to the theoretical density.