Process gas supply piping system
AssigneeTadahiro Ohmi
InventorsTadahiro Ohmi, Kazuhiko Sugiyawa, Fumio Nakahara, Masaru Umeda
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AssigneeTadahiro Ohmi
InventorsTadahiro Ohmi, Kazuhiko Sugiyawa, Fumio Nakahara, Masaru Umeda
Estimating the term…
This invention relates to the supply piping system of the process gas for various types of thin-film making and fine pattern dry etching process, and more particularly to the process gas supply system, which makes it possible to form high quality thin films and to perform high quality etching. Specifically, when there are a unit in operation with process gas supplied and a unit not in operation with no process gas supplied in a process gas supply piping system, supplying the process gas to two or more process units from a cylinder cabinet piping system, this invention provides a gas supply piping system, where the process gas supply piping line to the process unit not in operation can be purged with purge gas all the time and where gas flows all the time through all of gas supply piping lines to eliminate the stagnation of gas.
A process gas supply system for supplying process gas to at least two process units, comprising:
Dependencies are inferred from the claim text.