Electrical contact apparatus for use with plasma or glow discharge reaction chamber
AssigneeIntel Corporation
InventorsLeopoldo D. Yau, Galen H. Kawamoto
Life of this patent
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Abstract
An electrical contact apparatus for use in a plama or glow discharge chamber, particularly a chamber for depositing silicon oxynitride. A feedthrough member provides an electrical path between the interior and exterior of the chamber. An electrical contact member having an outwardly domed surface engages the feedthrough member. A non-conductive collar is disposed about the domed surface for limiting the flow of gas around the domed surface.
Claims1
In a plasma or glow discharge apparatus having a chamber to transfer energy into reactant gases to deposit silicon oxynitride on a plurality of wafers inserted into the chamber on a sled, an improvement to provide electrical contact between an electrode on the sled and a radio frequency generator disposed external to the chamber comprising:
- a feedthrough means for providing an electrical path from external of said chamber to internal of said chamber, said feedthrough means terminating in said chamber at a first surface;
- an electrode contact member having an outwardly domed surface in engagement with said first surface, said member providing an electrical path from said first surface to said electrode;
- a non-conducting collar disposed about said domed surface and engaging said first surface for limiting the flow of gases around said domed surface.
Dependencies are inferred from the claim text.